Scanning tunneling microscopic and field emission microscopic studies of nanostructured molybdenum film synthesized by electron cyclotron resonance plasma

Vishwas S. Purohit; A. B. Bhise; Shirshendu Dey; M. A. More; C. V. Dharmadhikari; D. S. Joag; Renu Pasricha; S. V. Bhoraskar

doi:10.1016/j.vacuum.2008.04.077

Scanning tunneling microscopic and field emission microscopic studies of nanostructured molybdenum film synthesized by electron cyclotron resonance plasma

Vishwas S. Purohit, A. B. Bhise, Shirshendu Dey, M. A. More, C. V. Dharmadhikari, D. S. Joag, Renu Pasricha, S. V. Bhoraskar

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Abstract

Cathodic sputtering is demonstrated to be effective in synthesizing thin films of molybdenum nanoparticles. An electron cyclotron resonance plasma reactor has been used as the source. The particle size distribution is found to be controllable by proper choice of the cathodic bias potential. Sizes ranging between 20 and 30 nm deposited at the optimum bias potential are found to exhibit a self assembled structure as observed by scanning tunneling microscopy. Field emission microscopic studies on these films supported on W have exhibited very stable emission current over a period of 3 h.

Original language	English (US)
Pages (from-to)	435-443
Number of pages	9
Journal	Vacuum
Volume	83
Issue number	2
DOIs	https://doi.org/10.1016/j.vacuum.2008.04.077
State	Published - Sep 26 2008

Keywords

ECR plasma
Field emission microscopy
Hollow cathode chemical sputtering
Mo nanoparticles
Scanning tunneling microscopy

ASJC Scopus subject areas

Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films

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10.1016/j.vacuum.2008.04.077

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@article{29f3a1a9bd00448cb332bb69ce557cf8,

title = "Scanning tunneling microscopic and field emission microscopic studies of nanostructured molybdenum film synthesized by electron cyclotron resonance plasma",

abstract = "Cathodic sputtering is demonstrated to be effective in synthesizing thin films of molybdenum nanoparticles. An electron cyclotron resonance plasma reactor has been used as the source. The particle size distribution is found to be controllable by proper choice of the cathodic bias potential. Sizes ranging between 20 and 30 nm deposited at the optimum bias potential are found to exhibit a self assembled structure as observed by scanning tunneling microscopy. Field emission microscopic studies on these films supported on W have exhibited very stable emission current over a period of 3 h.",

keywords = "ECR plasma, Field emission microscopy, Hollow cathode chemical sputtering, Mo nanoparticles, Scanning tunneling microscopy",

author = "Purohit, {Vishwas S.} and Bhise, {A. B.} and Shirshendu Dey and More, {M. A.} and Dharmadhikari, {C. V.} and Joag, {D. S.} and Renu Pasricha and Bhoraskar, {S. V.}",

note = "Funding Information: The authors thank the Department of Science and Technology, Government of India for the financial support. MAM and DSJ thank CNQS, UoP, Pune, for the partial financial support provided to carry out the field emission studies. Copyright: Copyright 2008 Elsevier B.V., All rights reserved.",

year = "2008",

month = sep,

day = "26",

doi = "10.1016/j.vacuum.2008.04.077",

language = "English (US)",

volume = "83",

pages = "435--443",

journal = "Vacuum",

issn = "0042-207X",

publisher = "Elsevier Limited",

number = "2",

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TY - JOUR

T1 - Scanning tunneling microscopic and field emission microscopic studies of nanostructured molybdenum film synthesized by electron cyclotron resonance plasma

AU - Purohit, Vishwas S.

AU - Bhise, A. B.

AU - Dey, Shirshendu

AU - More, M. A.

AU - Dharmadhikari, C. V.

AU - Joag, D. S.

AU - Pasricha, Renu

AU - Bhoraskar, S. V.

N1 - Funding Information: The authors thank the Department of Science and Technology, Government of India for the financial support. MAM and DSJ thank CNQS, UoP, Pune, for the partial financial support provided to carry out the field emission studies. Copyright: Copyright 2008 Elsevier B.V., All rights reserved.

PY - 2008/9/26

Y1 - 2008/9/26

N2 - Cathodic sputtering is demonstrated to be effective in synthesizing thin films of molybdenum nanoparticles. An electron cyclotron resonance plasma reactor has been used as the source. The particle size distribution is found to be controllable by proper choice of the cathodic bias potential. Sizes ranging between 20 and 30 nm deposited at the optimum bias potential are found to exhibit a self assembled structure as observed by scanning tunneling microscopy. Field emission microscopic studies on these films supported on W have exhibited very stable emission current over a period of 3 h.

AB - Cathodic sputtering is demonstrated to be effective in synthesizing thin films of molybdenum nanoparticles. An electron cyclotron resonance plasma reactor has been used as the source. The particle size distribution is found to be controllable by proper choice of the cathodic bias potential. Sizes ranging between 20 and 30 nm deposited at the optimum bias potential are found to exhibit a self assembled structure as observed by scanning tunneling microscopy. Field emission microscopic studies on these films supported on W have exhibited very stable emission current over a period of 3 h.

KW - ECR plasma

KW - Field emission microscopy

KW - Hollow cathode chemical sputtering

KW - Mo nanoparticles

KW - Scanning tunneling microscopy

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UR - http://www.scopus.com/inward/citedby.url?scp=51249105330&partnerID=8YFLogxK

U2 - 10.1016/j.vacuum.2008.04.077

DO - 10.1016/j.vacuum.2008.04.077

M3 - Article

AN - SCOPUS:51249105330

SN - 0042-207X

VL - 83

SP - 435

EP - 443

JO - Vacuum

JF - Vacuum

IS - 2

ER -

Scanning tunneling microscopic and field emission microscopic studies of nanostructured molybdenum film synthesized by electron cyclotron resonance plasma

Abstract

Keywords

ASJC Scopus subject areas

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