Silicon hydride composition of plasma-deposited hydrogenated amorphous and nanocrystalline silicon films and surfaces

Denise C. Marra, Erik A. Edelberg, Ryan L. Naone, Eray S. Aydil

Research output: Contribution to journalArticle

Abstract

In situ attenuated total reflection Fourier transform infrared spectroscopy was used to study the H bonding on the surfaces of a-Si:H and nc-Si:H during plasma enhanced chemical vapor deposition from SiH4/H2/Ar containing discharges. Well-resolved SiHx (1≤x≤3) absorption lines that correspond to the vibrational frequencies commonly associated with surface silicon hydrides were detected. During deposition of a-Si:H films using SiH4 without H2 dilution, the surface coverage was primarily di- and trihydrides, and there are very few dangling bonds on the surface. In contrast, during deposition of nc-Si:H using SiH4 diluted with H2, the amount of di- and trihydrides on the surface is drastically reduced and monohydrides dominate the surface. Furthermore, the vibrational frequencies of the monohydrides on nc-Si:H film surfaces match well with the resonant frequencies of monohydrides on H terminated Si (111) and Si (100) surfaces. The decrease of higher hydrides on the surface upon H2 dilution is attributed to increased dissociation rate of tri- and dihydrides on the surface through reaction with dangling bonds created by increased rate of H abstraction from the surface. Results presented are consistent with SiH3 being at least one of the precursors of a-Si:H deposition.

Original languageEnglish (US)
Pages (from-to)3199-3210
Number of pages12
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume16
Issue number6
DOIs
StatePublished - 1998

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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