Abstract
In this paper we present a novel spatially resolved sensor to detect the endpoint and monitor spatial uniformity for a plasma etching process. A scanning spatially-resolved optical emission spectroscopy (SROES) system was built and installed in Berkeley's Microfabrication Laboratory. This sensor system consists of a stepper motor, controller, and a monochrometer, which provides an in-situ real-time monitoring of the etching endpoint spatially. In this paper, we show the promise of this spatially-resolved endpoint detector, and explain our hardware design and the future experiment plan.
| Original language | English (US) |
|---|---|
| Pages (from-to) | B45-B48 |
| Journal | IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings |
| State | Published - 1997 |
| Event | Proceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference - San Francisco, CA, USA Duration: Oct 6 1997 → Oct 8 1997 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Industrial and Manufacturing Engineering
- Electrical and Electronic Engineering