Spatially resolved endpoint detector for plasma etcher

Roawen Chen, Sundeep Rangan, Costas J. Spanos

Research output: Contribution to journalConference article

Abstract

In this paper we present a novel spatially resolved sensor to detect the endpoint and monitor spatial uniformity for a plasma etching process. A scanning spatially-resolved optical emission spectroscopy (SROES) system was built and installed in Berkeley's Microfabrication Laboratory. This sensor system consists of a stepper motor, controller, and a monochrometer, which provides an in-situ real-time monitoring of the etching endpoint spatially. In this paper, we show the promise of this spatially-resolved endpoint detector, and explain our hardware design and the future experiment plan.

Original languageEnglish (US)
Pages (from-to)B45-B48
JournalIEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings
StatePublished - 1997
EventProceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference - San Francisco, CA, USA
Duration: Oct 6 1997Oct 8 1997

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Industrial and Manufacturing Engineering
  • Electrical and Electronic Engineering

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