Study of surface reactions during plasma enhanced chemical vapor deposition of SiO₂ from SiH₄, O₂, and Ar plasma

Material Science

• Hydride 100%
• Plasma-Enhanced Chemical Vapor Deposition 100%
• Surface Reaction 100%
• Silicon 80%
• Oxide Compound 40%
• Ion Implantation 40%
• Silane 40%
• Oxide Surface 40%
• Resonator 20%
• Fourier Transform Infrared Spectroscopy 20%
• Desorption 20%

Engineering

• Ar Plasma 100%
• Surface Oxide 100%
• Bombardment 50%
• Heterogeneous Reaction 50%
• Covered Surface 50%
• Surface Hydroxyl Group 50%

Keyphrases

• O2 Plasma 100%
• Ar Plasma 100%
• Silicon Hydride 42%
• Covering Surface 14%
• Ion-assisted 14%
• Surface Hydroxyl Groups 14%
• Heterogeneous Reaction 14%
• Si-H Bonds 14%
• Ar Ion Bombardment 14%
• O2 Flow Rate 14%
• Oxide Deposition 14%
• Thermal Removal 14%
• Helical Resonator 14%