Abstract
Submonolayer epitaxy in the presence of defect sites on the substrate is studied by means of a level-set method. Here, island nucleations occur by the creation of dimers and defect-monomer pairs. We present results for the scaled island size distribution (ISD) for growth with different densities for both random and regularly positioned defects. The dynamics show that for large D/F and defect density, all islands are nucleated at the defect sites in the very early stages of growth. We use scaling ideas to show that a gamma distribution can suitably describe the ISD.
Original language | English (US) |
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Pages (from-to) | 185-192 |
Number of pages | 8 |
Journal | Surface Science |
Volume | 569 |
Issue number | 1-3 |
DOIs | |
State | Published - Oct 1 2004 |
Keywords
- Epitaxy
- Growth
- Surface defects
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry