Tailoring the optical properties of boron doped μc-Si: H thin films by changing the SiH4/H2 ratio using RF-PECVD process

Ghada Dushaq; Ammar Nayfeh; Mahmoud Rasras

doi:10.1364/FIO.2016.FTu3F.2

Tailoring the optical properties of boron doped μc-Si: H thin films by changing the SiH₄/H₂ ratio using RF-PECVD process

Ghada Dushaq, Ammar Nayfeh, Mahmoud Rasras

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

This paper depicts the effect of SiH₄/H₂ dilution ratio (R) on the structural and optical properties of amorphous silicon matrix with embedded microcrystals of silicon. The thin films are prepared using standard RF-PECVD process at substrate temperature of 250 ° C.

Original language	English (US)
Title of host publication	Frontiers in Optics, FiO 2016
Publisher	Optica Publishing Group (formerly OSA)
ISBN (Print)	9781943580194
DOIs	https://doi.org/10.1364/FIO.2016.FTu3F.2
State	Published - 2016
Event	Frontiers in Optics, FiO 2016 - Rochester, United States Duration: Oct 17 2016 → Oct 21 2016

Publication series

Name	Optics InfoBase Conference Papers
ISSN (Electronic)	2162-2701

Other

Other	Frontiers in Optics, FiO 2016
Country/Territory	United States
City	Rochester
Period	10/17/16 → 10/21/16

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Mechanics of Materials

Access to Document

10.1364/FIO.2016.FTu3F.2

Cite this

Tailoring the optical properties of boron doped μc-Si: H thin films by changing the SiH₄/H₂ ratio using RF-PECVD process. / Dushaq, Ghada; Nayfeh, Ammar; Rasras, Mahmoud.
Frontiers in Optics, FiO 2016. Optica Publishing Group (formerly OSA), 2016. (Optics InfoBase Conference Papers).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Dushaq, G, Nayfeh, A & Rasras, M 2016, Tailoring the optical properties of boron doped μc-Si: H thin films by changing the SiH₄/H₂ ratio using RF-PECVD process. in Frontiers in Optics, FiO 2016. Optics InfoBase Conference Papers, Optica Publishing Group (formerly OSA), Frontiers in Optics, FiO 2016, Rochester, United States, 10/17/16. https://doi.org/10.1364/FIO.2016.FTu3F.2

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