Abstract
Time-resolved optical emission spectroscopy, anon-intrusive diagnostic method, is applied to analyze pulsed DC magnetron plasmas during the sputter deposition of TiO 2 thin films. The studies are focused on the temporal behavior of the emissions of atomic titanium, argon and oxygen in three chosen spectral regions during the "on-time" and the "reverse-time" of the plasma. Single and double exponential decays of the optical emissions are observed during the reverse period. A slow increase of the optical emissions which follow the conduction current is observed during the start of "on-time". The various time constants can be related to the dynamics of the fast electrons, the Ar metastables, the Ti atoms (metallic mode), and the O atoms (oxide mode).
Original language | English (US) |
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Title of host publication | Proceedings, Annual Technical Conference - Society of Vacuum Coaters |
Pages | 62-67 |
Number of pages | 6 |
State | Published - 2005 |
Event | SVC, Society of Vacuum Coaters - 48th Annual Technical Conference - Denver, CO, United States Duration: Apr 23 2005 → Apr 28 2005 |
Other
Other | SVC, Society of Vacuum Coaters - 48th Annual Technical Conference |
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Country/Territory | United States |
City | Denver, CO |
Period | 4/23/05 → 4/28/05 |
Keywords
- Optical emission spectroscopy
- Pulsed plasma
- Reactive sputtering
- Titania
ASJC Scopus subject areas
- Mechanical Engineering
- Surfaces and Interfaces
- Fluid Flow and Transfer Processes
- Surfaces, Coatings and Films