Time-resolved optical emission spectroscopy during pulsed DC magnetron sputter deposition of TiO 2 thin films

W. Zhu, J. Lopez, A. Belkind, K. Becker

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Time-resolved optical emission spectroscopy, anon-intrusive diagnostic method, is applied to analyze pulsed DC magnetron plasmas during the sputter deposition of TiO 2 thin films. The studies are focused on the temporal behavior of the emissions of atomic titanium, argon and oxygen in three chosen spectral regions during the "on-time" and the "reverse-time" of the plasma. Single and double exponential decays of the optical emissions are observed during the reverse period. A slow increase of the optical emissions which follow the conduction current is observed during the start of "on-time". The various time constants can be related to the dynamics of the fast electrons, the Ar metastables, the Ti atoms (metallic mode), and the O atoms (oxide mode).

Original languageEnglish (US)
Title of host publicationProceedings, Annual Technical Conference - Society of Vacuum Coaters
Pages62-67
Number of pages6
StatePublished - 2005
EventSVC, Society of Vacuum Coaters - 48th Annual Technical Conference - Denver, CO, United States
Duration: Apr 23 2005Apr 28 2005

Other

OtherSVC, Society of Vacuum Coaters - 48th Annual Technical Conference
CountryUnited States
CityDenver, CO
Period4/23/054/28/05

Keywords

  • Optical emission spectroscopy
  • Pulsed plasma
  • Reactive sputtering
  • Titania

ASJC Scopus subject areas

  • Mechanical Engineering
  • Surfaces and Interfaces
  • Fluid Flow and Transfer Processes
  • Surfaces, Coatings and Films

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