Time-resolved optical emission spectroscopy during pulsed DC magnetron sputter deposition of TiO 
            2 thin films

W. Zhu; J. Lopez; A. Belkind; K. Becker

Time-resolved optical emission spectroscopy during pulsed DC magnetron sputter deposition of TiO ₂ thin films

W. Zhu, J. Lopez, A. Belkind, K. Becker

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Time-resolved optical emission spectroscopy, anon-intrusive diagnostic method, is applied to analyze pulsed DC magnetron plasmas during the sputter deposition of TiO ₂ thin films. The studies are focused on the temporal behavior of the emissions of atomic titanium, argon and oxygen in three chosen spectral regions during the "on-time" and the "reverse-time" of the plasma. Single and double exponential decays of the optical emissions are observed during the reverse period. A slow increase of the optical emissions which follow the conduction current is observed during the start of "on-time". The various time constants can be related to the dynamics of the fast electrons, the Ar metastables, the Ti atoms (metallic mode), and the O atoms (oxide mode).

Original language	English (US)
Title of host publication	Proceedings, Annual Technical Conference - Society of Vacuum Coaters
Pages	62-67
Number of pages	6
State	Published - 2005
Event	SVC, Society of Vacuum Coaters - 48th Annual Technical Conference - Denver, CO, United States Duration: Apr 23 2005 → Apr 28 2005

Other

Other	SVC, Society of Vacuum Coaters - 48th Annual Technical Conference
Country/Territory	United States
City	Denver, CO
Period	4/23/05 → 4/28/05

Keywords

Optical emission spectroscopy
Pulsed plasma
Reactive sputtering
Titania

ASJC Scopus subject areas

Mechanical Engineering
Surfaces and Interfaces
Fluid Flow and Transfer Processes
Surfaces, Coatings and Films

Cite this

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title = "Time-resolved optical emission spectroscopy during pulsed DC magnetron sputter deposition of TiO 2 thin films",

abstract = "Time-resolved optical emission spectroscopy, anon-intrusive diagnostic method, is applied to analyze pulsed DC magnetron plasmas during the sputter deposition of TiO 2 thin films. The studies are focused on the temporal behavior of the emissions of atomic titanium, argon and oxygen in three chosen spectral regions during the {"}on-time{"} and the {"}reverse-time{"} of the plasma. Single and double exponential decays of the optical emissions are observed during the reverse period. A slow increase of the optical emissions which follow the conduction current is observed during the start of {"}on-time{"}. The various time constants can be related to the dynamics of the fast electrons, the Ar metastables, the Ti atoms (metallic mode), and the O atoms (oxide mode).",

keywords = "Optical emission spectroscopy, Pulsed plasma, Reactive sputtering, Titania",

author = "W. Zhu and J. Lopez and A. Belkind and K. Becker",

year = "2005",

language = "English (US)",

pages = "62--67",

booktitle = "Proceedings, Annual Technical Conference - Society of Vacuum Coaters",

note = "SVC, Society of Vacuum Coaters - 48th Annual Technical Conference ; Conference date: 23-04-2005 Through 28-04-2005",

}

TY - GEN

T1 - Time-resolved optical emission spectroscopy during pulsed DC magnetron sputter deposition of TiO 2 thin films

AU - Zhu, W.

AU - Lopez, J.

AU - Belkind, A.

AU - Becker, K.

PY - 2005

Y1 - 2005

N2 - Time-resolved optical emission spectroscopy, anon-intrusive diagnostic method, is applied to analyze pulsed DC magnetron plasmas during the sputter deposition of TiO 2 thin films. The studies are focused on the temporal behavior of the emissions of atomic titanium, argon and oxygen in three chosen spectral regions during the "on-time" and the "reverse-time" of the plasma. Single and double exponential decays of the optical emissions are observed during the reverse period. A slow increase of the optical emissions which follow the conduction current is observed during the start of "on-time". The various time constants can be related to the dynamics of the fast electrons, the Ar metastables, the Ti atoms (metallic mode), and the O atoms (oxide mode).

AB - Time-resolved optical emission spectroscopy, anon-intrusive diagnostic method, is applied to analyze pulsed DC magnetron plasmas during the sputter deposition of TiO 2 thin films. The studies are focused on the temporal behavior of the emissions of atomic titanium, argon and oxygen in three chosen spectral regions during the "on-time" and the "reverse-time" of the plasma. Single and double exponential decays of the optical emissions are observed during the reverse period. A slow increase of the optical emissions which follow the conduction current is observed during the start of "on-time". The various time constants can be related to the dynamics of the fast electrons, the Ar metastables, the Ti atoms (metallic mode), and the O atoms (oxide mode).

KW - Optical emission spectroscopy

KW - Pulsed plasma

KW - Reactive sputtering

KW - Titania

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M3 - Conference contribution

AN - SCOPUS:33644993922

SP - 62

EP - 67

BT - Proceedings, Annual Technical Conference - Society of Vacuum Coaters

T2 - SVC, Society of Vacuum Coaters - 48th Annual Technical Conference

Y2 - 23 April 2005 through 28 April 2005

ER -