Tuning the optical signature of few-layer MoS2 on silicon substrate using mechanical nano-stamping approach

Ghada Dushaq; Pawan Mishra; Mahmoud Rasras

doi:10.1364/CLEO_AT.2020.JTu2B.13

Tuning the optical signature of few-layer MoS₂ on silicon substrate using mechanical nano-stamping approach

Ghada Dushaq, Pawan Mishra, Mahmoud Rasras

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Spatially modulated biaxial tensile strain in a few-layers MoS2 on pre-patterned Si substrate is demonstrated. Using depth-controlled nanoindentation, localized strain on Si is achieved. Results are verified by observing shifts in the MoS2's bandgap and phonon modes.

Original language	English (US)
Title of host publication	CLEO
Subtitle of host publication	Applications and Technology, CLEO_AT 2020
Publisher	OSA - The Optical Society
ISBN (Electronic)	9781557528209
ISBN (Print)	9781943580767
DOIs	https://doi.org/10.1364/CLEO_AT.2020.JTu2B.13
State	Published - 2020
Event	CLEO: Applications and Technology, CLEO_AT 2020 - Washington, United States Duration: May 10 2020 → May 15 2020

Publication series

Name	Optics InfoBase Conference Papers
Volume	Part F181-CLEO-AT 2020

Conference

Conference	CLEO: Applications and Technology, CLEO_AT 2020
Country/Territory	United States
City	Washington
Period	5/10/20 → 5/15/20

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Mechanics of Materials

Access to Document

10.1364/CLEO_AT.2020.JTu2B.13

Cite this

Tuning the optical signature of few-layer MoS₂ on silicon substrate using mechanical nano-stamping approach. / Dushaq, Ghada; Mishra, Pawan; Rasras, Mahmoud.
CLEO: Applications and Technology, CLEO_AT 2020. OSA - The Optical Society, 2020. JTu2B.13 (Optics InfoBase Conference Papers; Vol. Part F181-CLEO-AT 2020).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Dushaq, G, Mishra, P & Rasras, M 2020, Tuning the optical signature of few-layer MoS₂ on silicon substrate using mechanical nano-stamping approach. in CLEO: Applications and Technology, CLEO_AT 2020., JTu2B.13, Optics InfoBase Conference Papers, vol. Part F181-CLEO-AT 2020, OSA - The Optical Society, CLEO: Applications and Technology, CLEO_AT 2020, Washington, United States, 5/10/20. https://doi.org/10.1364/CLEO_AT.2020.JTu2B.13

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