Tuning the optical signature of few-layer MoS2 on silicon substrate using mechanical nano-stamping approach

Ghada Dushaq, Pawan Mishra, Mahmoud Rasras

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Spatially modulated biaxial tensile strain in a few-layers MoS2 on pre-patterned Si substrate is demonstrated. Using depth-controlled nanoindentation, localized strain on Si is achieved. Results are verified by observing shifts in the MoS2's bandgap and phonon modes.

Original languageEnglish (US)
Title of host publicationCLEO
Subtitle of host publicationApplications and Technology, CLEO_AT 2020
PublisherOSA - The Optical Society
ISBN (Electronic)9781557528209
DOIs
StatePublished - 2020
EventCLEO: Applications and Technology, CLEO_AT 2020 - Washington, United States
Duration: May 10 2020May 15 2020

Publication series

NameOptics InfoBase Conference Papers
VolumePart F181-CLEO-AT 2020

Conference

ConferenceCLEO: Applications and Technology, CLEO_AT 2020
Country/TerritoryUnited States
CityWashington
Period5/10/205/15/20

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Mechanics of Materials

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