Tuning the Optical Signature of Few-Layer MoS2 on Silicon Substrate using Mechanical Nano-Stamping Approach

Ghada Dushaq, Pawan Mishra, Mahmoud Rasras

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Spatially modulated biaxial tensile strain in a few-layers MoS2 on pre-patterned Si substrate is demonstrated. Using depth-controlled nanoindentation, localized strain on Si is achieved. Results are verified by observing shifts in the MoS2's bandgap and phonon modes.

Original languageEnglish (US)
Title of host publication2020 Conference on Lasers and Electro-Optics, CLEO 2020 - Proceedings
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781943580767
StatePublished - May 2020
Event2020 Conference on Lasers and Electro-Optics, CLEO 2020 - San Jose, United States
Duration: May 10 2020May 15 2020

Publication series

NameConference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
Volume2020-May
ISSN (Print)1092-8081

Conference

Conference2020 Conference on Lasers and Electro-Optics, CLEO 2020
CountryUnited States
CitySan Jose
Period5/10/205/15/20

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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