Abstract
The ion current density and corresponding uniformity in Ar/SF6 and Ar/Cl2 discharges were measured using a two-dimensional array of planar Langmuir probes which were built on a 200 mm diameter silicon wafer. Experiments were conducted in a high-density inductively coupled plasma reactor which was equipped with multiple plasma and surface diagnostics. Results indicated that the ion current density in a pure argon discharge increased with increased pressure and the discharges became more uniform as ion diffusion rate slowed down at high pressures.
Original language | English (US) |
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Pages (from-to) | 6444-6450 |
Number of pages | 7 |
Journal | Journal of Applied Physics |
Volume | 92 |
Issue number | 11 |
DOIs | |
State | Published - Dec 1 2002 |
ASJC Scopus subject areas
- General Physics and Astronomy