V205 xerogel films as intercalation hosts for lithium: I. Insertion stoichiometry, site concentration, and specific energy

HK Park, WH Smyrl, Michael Ward

Research output: Contribution to journal › Article › peer-review

Original language	English (US)
Pages (from-to)	1068
Journal	Journal of the Electrochemical Society
Volume	142
State	Published - 1995

Cite this

@article{ce5cb5951ebf45eaab2041b0846fd7dd,

title = "V205 xerogel films as intercalation hosts for lithium: I. Insertion stoichiometry, site concentration, and specific energy",

author = "HK Park and WH Smyrl and Michael Ward",

year = "1995",

language = "English (US)",

volume = "142",

pages = "1068",

journal = "Journal of the Electrochemical Society",

issn = "0013-4651",

publisher = "Institute of Physics",

}